E-Journal AIP

Anno: 2021X–ray and electron spectroscopy of (photo)electrocatalysts: Understanding activity through electronic structure and adsorbate coverage ; 2021, Vol. 39, n. 4
Mechanism of highly selective etching of SiCN by using NF3/Ar–based plasma ; 2021, Vol. 39, n. 4
Determining valence band offsets in heterojunctions using a single core–level x–ray photoelectron spectrum ; 2021, Vol. 39, n. 4
Direct current and high power impulse magnetron sputtering discharges with a positively biased anode ; 2021, Vol. 39, n. 4
Characteristics of carbon–containing low–k dielectric SiCN thin films deposited via remote plasma atomic layer deposition ; 2021, Vol. 39, n. 4
Hybrid molecular beam epitaxy growth of BaTiO3 films ; 2021, Vol. 39, n. 4
Two–step model for reduction reaction of ultrathin nickel oxide by hydrogen ; 2021, Vol. 39, n. 4
Role of sublimation kinetics of ammonia borane in chemical vapor deposition of uniform, large–area hexagonal boron nitride ; 2021, Vol. 39, n. 4
Titanium infiltration into ultrathin PMMA brushes ; 2021, Vol. 39, n. 4
Surface plasmon resonance is possible in an optical fiber tapered to a point ; 2021, Vol. 39, n. 4
Evaluation of nickel self–sputtering yields by molecular–dynamics simulation ; 2021, Vol. 39, n. 4
Performance and reliability of β–Ga2O3Schottky barrier diodes at high temperature ; 2021, Vol. 39, n. 4
Thermal atomic layer etching of amorphous and crystalline Al2O3 films ; 2021, Vol. 39, n. 4
Surface damage formation during atomic layer etching of silicon with chlorine adsorption ; 2021, Vol. 39, n. 4
Preface for the special topic collection Honoring Dr. Art Gossard’s 85th Birthday and his Leadership in the Science and Technology of Molecular Beam Epitaxy ; 2021, Vol. 39, n. 4
Focus ring geometry influence on wafer edge voltage distribution for plasma processes ; 2021, Vol. 39, n. 4
Vapor deposition of CsPbBr3thin films by evaporation of CsBr and PbBr2 ; 2021, Vol. 39, n. 4
Photoelectron diffraction: Early demonstrations and alternative modes ; 2021, Vol. 39, n. 4
A high–power impulse magnetron sputtering global model for argon plasma–chromium target interactions ; 2021, Vol. 39, n. 4
Multilayer ultraviolet reflective coating based on atomic layer deposited aluminum oxide and fluoride ; 2021, Vol. 39, n. 4
Zirconia–titania–doped tantala optical coatings for low mechanical loss Bragg mirrors ; 2021, Vol. 39, n. 4
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron–enhanced atomic layer deposition ; 2021, Vol. 39, n. 4
Silicon–ion implantation induced doping and nanoporosity in molecular beam epitaxy grown GaSb epitaxial films ; 2021, Vol. 39, n. 4
Numerical ellipsometry: A method for selecting a near–minimal infrared measurement set for β–gallium oxide ; 2021, Vol. 39, n. 5
Role of hydrogen species in promoting photoluminescence from Eu3+–doped ZnO thin films via bandgap excitation ; 2021, Vol. 39, n. 5