Direct current and high power impulse magnetron sputtering discharges with a positively biased anode / Rainer Hippler; Martin Cada; Zdenek Hubicka
Si trova su / Altri legami
© 2021 Author(s).A magnetron sputtering discharge with a positively biased anode in argon gas is investigated by Langmuir probe diagnostics and by energy–resolved mass spectrometry. The discharge is operated in continuous (direct current) and in pulsed (high power impulse magnetron sputtering, Hi) mode with a Ti target and in Ar gas. Singly–charged Ar+ Ti+, and Ar2+ and doubly–charged Ar2+ and Ti2+ ions are observed. A novel approach is to bias the magnetron anode. Application of a positive anode voltage shifts the kinetic energies of plasma ions by qe0Va, where Va is the anode voltage and qe0 is the ion charge. It allows for an effective control of plasma ion energies.
